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发表于 2012-11-7 18:45:20
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DCAP is built from MOS transistor and used mos gate cap, the gate leakage of dcap is a significant contributor in sub-40nm process.
In some cases, DCAP does not increase the total chip area since io may become the limiting factor of chip area.
DCAP quality also affect the ESD level of the chip, and thus the DCAP always has R (mos D-S resitor) connected to the gate terminal of MOS cap. |
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