JOMM期刊特刊征稿启事

deng0710

Call For Papers: Journal ofMicroelectronic Manufacturing (JoMM)

Dear colleagues,

We are pleased to invite you to contribute to an upcomingSpecial Topics on Computational Lithography in JoMM, a journal  devoted to publishing researches on thecutting-edge microelectronic manufacturing technology. JoMM, produced byJoMMPublish in Altamont, New York, USA, is an open-access journal with freepublication. It is supported by the University of the Chinese Academy ofSciences (UCAS) and the Institute of Microelectronics of the Chinese Academy ofSciences (IMECAS). The journal is indexed in major databases includingCrossref, DOAJ, CNKI, CSTJ, and CAS. The scope of the journal covers studies ofadvanced semiconductor manufacturing sciences and technologies from fundamentalresearch to industrial high volume manufacturing applications.

This special issue aims tohighlight the cutting-edge progress, persistent challenges, and groundbreakinginnovations in Computational Lithography, a pivotal technology for semiconductormanufacturing. By focusing on the developments, implementations, andoptimizations of computational lithography techniques, this issue explores transformativebreakthroughs across key areas, including:

-Fast and accurate Mask3D modeling

-Mask3D-compatible Hopkins imaging

-Wafer3D imaging  theory

-Resist modeling and etching simulations

-Curvilinear mask and OPC

-Inverse lithography technology

-Source mask optimization (SMO)

-GPU and tensor processor hardware accelerations

-Machine learning applied in computational lithography

Weinvite original research articles, reviews, and perspectives that contribute tothe advancement of computational lithography and its applications incutting-edge semiconductor manufacturing, by tackling critical challenges inpattern fidelity, computational scalability, and process variabilities.

Guest Editors

Dr. David H. Wei, QuanticaComputing LLC, San Jose, California, USA

Prof. Xu Ma, Beijing Institute ofTechnology, Beijing, China

How to Submit

l  Tosubmit your work, please visit: http://jommpublish.org/

l  Forany inquiries or suggestions, please contact the JoMM editorial office.

l E-mail: jomm@jommpublish.org

Thankyou and best regards.

Yourssincerely,

DavidH. Wei & Xu Ma