|
马上注册,结交更多好友,享用更多功能,让你轻松玩转社区。
您需要 登录 才可以下载或查看,没有账号?注册
x
不知道站上的神人..誰有這本書..??
Amazon的資料如下..
書名:Atomic Layer Deposition for Nanotechnology
Product Details- Hardcover: 256 pages
- Publisher: Ivoryton Press; First edition (June 16, 2008)
- Language: English
- ISBN-10: 0981466346
- ISBN-13: 978-0981466347
Product DescriptionThis monograph is the first text to review the subject of Atomic Layer Deposition (ALD) comprehensively. It not only covers its application to microelectronics, but also many important new and emerging applications in Nanotechnology. It is the culmination of over 10 years of pioneering research and development by the author. Not only does it cover thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides, but also reviews the formation of mixed and multilayer materials. Also, the newer radical enhanced technology is described and evaluated. Finally, the author presents some of the most recent applications of ALD to the emerging field of Nanotechnology. These include MEMS, solar cells, optical coatings, and organic/inorganic films among others. This treatment of an important and emerging technology will be particularly useful to engineers and scientists both in industry and universities.
About the AuthorDr. Sherman is a well known scientist working in the technology of Chemical Vapor Deposition. He has published extensively including many journal articles, book chapters, and the text Chemical Vapor Deposition for Microelectronics. He is also the holder of over ten patents. Industrial experience includes work at GE, RCA, Applied Materials, and Varian Associates. |
|