求助~帮忙下载几篇IEEE文章

PN_Allen

求助好心人~


如下四篇文章
1. Self-Aligned Single Diffusion Break Technology Optimization Through Material Engineering for Advanced CMOS Nodes
    DOI: 10.23919/SISPAD49475.2020.9241625
    Self-Aligned Single Diffusion Break Technology Optimization Through Material Engineering for Advanced CMOS Nodes | IEEE Conference Publication | IEEE Xplore

2. Fin-shape Optimization for Single Diffusion Break Device Performance in FinFET Technology
    DOI: 10.1109/VLSI-TSA54299.2022.9771011
    Fin-shape Optimization for Single Diffusion Break Device Performance in FinFET Technology | IEEE Conference Publication | IEEE Xplore

3. Simulation Study on Different Integration Schemes to Form Single Diffusion Break
    DOI: 10.1109/CSTIC55103.2022.9856757
    Simulation Study on Different Integration Schemes to Form Single Diffusion Break | IEEE Conference Publication | IEEE Xplore

4. Novel Postgate Single Diffusion Break Integration in Gate-All-Around Nanosheet Transistors to Achieve Remarkable Channel Stress for N/P Current Matching
    DOI: 10.1109/TED.2021.3139579
    Novel Postgate Single Diffusion Break Integration in Gate-All-Around Nanosheet Transistors to Achieve Remarkable Channel Stress for N/P Current Matching | IEEE Journals & Magazine | IEEE Xplore

CSFOC

供参考1

PN_Allen

太帅了，谢谢

CSFOC

不用客气，用的着就行