请教各位一个关于smic40nm版图绘画过程中的问题。由于以前从来没接触过40nm版图,只画过180nm的,现在自己练习画了反相器电路,有DRC的问题看不懂。版图画完之后,有以下两个报错看不懂。
1、ALPA must be a drawn layer.(ALPA是做什么的呀?它必须画,对版图的意义是什么?怎么画?)我试过画一个很大的ALPA方块把所有版图全部覆盖,就不再显示这个错误了。
2、MD(passivation 2) must be a drawn layer.(问题同上)
Wire bond pad should include one layer of solid ALPA and two layers of solid Cu metal (TM and TM-1). It is not allowed to draw metal slot for ALPA, TM and TM-1 in wire bond pad area.
For example: For 40nm 1P8M design
Two thick top metal case: TM2 and TM1 should be solid.
One thick top metal case: TM2 and M7 should be solid.