Papers：Deep Submicron MOSFETs ！

semico_ljj

K. Banerjee, A. Amerasekera, J.A. Kittl, C. Hu, "High Current Effects in Silicide Films for Sub-0.25 Micron VLSI Technologies," IEEE International Reliability Physics Symposium Proceedings

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M. Orshansky, D. Sinitsky, P. Scrobohaci, J. Bokor, C. Hu, "Impact of Velocity Overshoot, Polysilicon Depletion, and Inversion Layer Quantization on NMOSFET Scaling," 56th Annual Device Research Conference

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Keynote Speech, C. Hu, "From CMOS to Nanotechnology," 2006 Advanced Semiconductor Manufacturing Conference (ASMC), Boston, May 2006

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B.K. Liew, N.W. Cheung, C. Hu, "Electromigration Interconnect Lifetime Under AC and Pulse DC Stress," Proc. International Reliability Physics Symp

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R. Moazzami, J. Lee, I. Chen, C. Hu, "Projecting the Minimum Acceptable Oxide Thickness for Time Dependent Dielectric Breakdown," Tech. Digest of International Electron Devices Meeting (IEDM)

fanjx

做model好好看看

gouleb1

thanks for your information......................