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查看: 9135|回复: 9

[求助] 请问核心器件和输入输出器件到底有什么不一样?

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发表于 2014-3-2 16:23:28 | 显示全部楼层 |阅读模式

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举一个例子,SMIC 0.13um 工艺中有核心器件和输入输出器件两种【如下表红部分表示】,请问他们到底有什么区别,在设计模拟和数字部分时该怎样考虑
标准工艺组件选择0.13μm低漏电器件 (1.5V)0.13μm高性能通用器件(1.2V)
核心器件高阈值电压
标准阈值电压
低阈值电压
输入输出器件2.5V
3.3V
内存
(缩小之前)
单端静态内存 (2.43μm2)
单端静态内存(2.14μm2)
单端静态内存(2.03μm2)

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发表于 2014-3-3 09:09:29 | 显示全部楼层
I/O MOS用的是厚氧化层,core MOS是薄氧化层。I/O MOS的Lmin要比core的大2倍左右吧,阈值也更大,耐压能力强,驱动能力强,可以做输入输出驱动,可以做ESD。貌似也可以用来实现内部的模拟电路部分。
tsmc90n LP工艺的core mos的电压也是1.2V,没想到0.13的也是1.2V,这样阈值会不会更大使得设计模拟电路更有挑战啊。90n的阈值在300mV~400mV,0.13的是多少??
这是我的浅见,请大家指正,谢谢
发表于 2014-3-3 11:57:32 | 显示全部楼层
0.13um 基本是400-500mV
发表于 2014-3-3 11:58:08 | 显示全部楼层
90n的阈值在300mV~400mV???
是不是低了点?
发表于 2014-3-3 11:58:46 | 显示全部楼层
应该是接近400mV左右
发表于 2014-3-3 12:15:57 | 显示全部楼层
QQ截图20140303122033.jpg 回复 4# semico_ljj
 楼主| 发表于 2014-3-3 12:22:30 | 显示全部楼层


谢谢你的回复,觉得你说的比较有道理,我也从网上找到了类似的说明资料,我把它粘贴在下面。

http://www.circuitdesign.info/blog/2008/11/typical-cmos-deviceprocess-options/

Typical CMOS device/process optionsBy POOJAN WAGH | Published: NOVEMBER 29, 2008

I received an inquiry on how to reduce leakage. I will cover how to do so in a future article. However, before I do, let’s go over some process options that effect leakage.

Core Devices

Typically, foundries offer a few variations of there processes. I will call them general purpose (GP) and low power (LP). They differ in what I call the core devices, after which a process is usually named—for example, CMOS090 (90 nm) or TSMC 0.18μm.

GP

The GP represents the state of the art and usually drives large digital IC’s, including general purpose microprocessors and DSP’s. The traits of the GP process are a lower threshold and supply voltage, and possibly smaller effective gate length.

LP

The LP is usually a variant of the GP process optimized to reduce leakage (at the expense of speed). The LP option is usually used for highly integrated analog & RF CMOS IC’s, such as radios (RF transceivers), ADC’s, etc. Typically, the LP allows for a slightly higher supply voltage and sometimes has a slightly larger effective gate length. However, the main trait of the LP process is that the threshold is increased a bit from the GP process to allow for lower leakage. I’m not entirely sure if the higher supply voltage and gate length are intentional or are a byproduct of the higher threshold.

I/O Devices

Almost universally, all modern processes offer an “I/O” device. This is essentially a device from a prior process node (1.8 V, 2.5 V, or 3.3 V) with a larger gate length (0.18 um, 0.25 um, or 0.35 um). They are provided from a digital perspective as devices for pad drivers etc. However, they usually form the workhorse of analog/RF IC’s especially at baseband.

Device options

In both the GP and LP flavors, there are additional device options not necessarily universally, but usually:

  • High-Vt: a core device with the threshold increased for lower leakage. This is also useful for larger output range on a diff pair—which depends on the input devices’ Vt—but usually an I/O device is even better.
  • Low-Vt: a core device with the threshold decreased for higher performance (at the expense of leakage)
  • Zero-Vt: a core device with a zero threshold voltage. This is useful for bypass switches and source followers.

These devices usually require additional mask steps and therefore incur additional processing costs.

Leakage

Basically, to minimize leakage, one should use the device with the highest threshold voltage that gets the job done. In order of preference:

  • I/O Device
  • High-Vt core device (if it is already available or if the expense makes sense)
  • Core (medium-Vt) devices

Of course, each of these options have the implicit tradeoff of performance/speed at the expense of leakage. What do you do when you want performance during active operation and low leakage during a standby mode? I will detail two methods in a future article.

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发表于 2014-3-3 15:11:22 | 显示全部楼层
回复 2# lishiliang

what your comments are right except using I/O device as ESD. Standard ESD device should have extended Drain region for evenly discharging current.
发表于 2014-3-4 10:24:26 | 显示全部楼层
回复 8# wfcawy


   yes, U R right~tks
发表于 2023-12-18 21:47:10 | 显示全部楼层
nice!
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