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发表于 2007-4-6 14:09:30
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Conclusions
ESD is a destructive phenomenon that causes reliability problems and even permanent
damage to the ICs. With the aggressive scaling of modern deep-submicron salicided CMOS
technologies, the ICs are becoming more vulnerable to ESD. To prevent the ESD related failures,
efficient on-chip protection structures are needed. However, a protection scheme that is suitable
in the present technology may not be useful for the future generations of the technology.
Therefore, a systematic approach is needed for ESD protection circuit design that can be
transferred to the future technologies. To develop an ESD design methodology, a good
understanding of the device physics under high current (electric field/temperature) conditions is
essential. In this report, we presented a complete design methodology along with some new
effects that are observed in 0.13 μm CMOS technology. We discussed the effects of bias
conditions and layout parameters on the ESD robustness of an NMOS device for both silicided
and non-silicided structures. We observed that an appropriate combination of bias conditions and
layout parameters could maximize the ESD robustness of the device. This optimization can be
achieved by developing simulation tools for ESD circuits. |
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