|
发表于 2014-1-14 23:22:13
|
显示全部楼层
本帖最后由 abonic 于 2014-1-14 23:23 编辑
回复 16# jiangyanjin
It depends, for long channel devices, Vth increases as Leff increases just as the case in Razavi's textbook,
However, in modern process (i.e. 130nm or 65nm), as Leff increases, Vth increases at first and decreases at
a certain Leff point. Very interesting. This is so called RSCE effect |
|