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本帖最后由 1sland 于 2010-11-23 01:06 编辑
SILICON RUN DEPOSITION uses 3D atomic animation and live manufacturing footage to provide a detailed close-up look at the process of thin film deposition in CMOS fabrication. It shows the chemical and physical reactions that create the dielectric and conductive layers of an integrated circuit.
SILICON RUN DEPOSITION examines the selection of raw materials according to the process and equipment to be used and the material’s ability to produce quality films with the desired properties. Also featured is the intricate role that temperature, time, pressure, and reactant concentrations all play at the atomic level.
Running Time: 31 minutes
"Silicon Run Deposition is especially popular with the students. We will use it to augment some of our undergraduate classes as well as some graduate seminars. It will also be included in our regularly scheduled viewing of the other Silicon Run videos, and I’ll keep a copy in my office for students to browse and for other professors to use."Stefan Myhajlenko, Center for Solid States Electronics, Arizona State University
Deposition Topic Summary
- CMOS Technology
- Spin-On Deposition
- Atomic Reactions
- Film Properties
- Thin Film Applications
- Planarization
- Gaseous, Solid, & Liquid Raw Materials
- Thin Film Electrical Properties
- Growth Process (Oxidation)
- Multilevel Metalization
- Physical Vapor Deposition (Sputtering)
- Chemical Vapor Deposition (APCDV, LPCVD, PECVD）
此片为9集中的一集，由Intel和Apple等多机构联合摄制，包括微电子制造的多方面。
对于中国电子行业的你和我，相信没有人不需要的！！！！
我已下载，成为一个资源，
待续……敬请关注！
（资源有限，大家一起努力） |
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发表于 2010-11-23 00:57:53
