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发表于 2019-12-27 19:43:30
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The on-resistance for diodes in forward-bias in deep submicron technologies is typically 5 ohm per micron width, while in reverse bias the resistance could be 10 to 100 times higher. Accurate modeling of this resistance is essential for circuit simulations of MOS and diode ESD protection circuits.
At low-injection levels the current density, J f , is dominated by the drift current. However, at moderate and high-injection levels, J f is dominated by diffusion currents in the vicinity of the junctions.
The high-level injection operation of the diodes needs to be accurately modeled, for accurate ESD simulation.
Any standard diode model that includes avalanche breakdown may be used. However, care must be taken not to include the built-in series resistance in the model. This is a fixed resistance, which could lead to an overestimation of the voltage dropped across the diode under high-current injection.
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Adapted from ESD in Silicon Integrated Circuits, 2nd Edition
Ajith Amerasekera, Charvaka Duvvury |
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