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[求助] smic 55nm e-Flash cross section of interconnection structures

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发表于 2017-2-27 15:03:13 | 显示全部楼层 |阅读模式

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Dear all,
        For the smic 55nm e-flash, it provides 2 poly process. From the document description, one poly is Poly(LL) and another poly is Poly(HV). Now, I need to create the substrate file description for momentum synthesize. Therefore, I need to clarify the position of Poly(LL) and Poly(HV) layer in the process.

        Based on the cross section of interconnection structure picture, the Poly(LL) and Poly(HV) are located in the same layer. However, I am not sure the meaning of the picture shown.
(1) Does it mean that Poly(LL) and Poly(HV) could locate in this layer?
(2) Is Poly(HV) made from Poly(LL) + some extra layer?

Thanks,
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