毕设作死的接了个模拟仿真的题目,AlGaNGaN HEMT器件势垒层的结构和掺杂研究,,现在还没搞定。。。GaN_HFET_dc这个例子自带的说明里有这么一句:
The simulated device structure includes a 2um GaN bulk layer, capped by a 25 nm Al x Ga 1–x N barrier, with x=0.3 ,defined by the Sentaurus Workbench variable.
然后swb显示有个变量x初始值是0.3: