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Sentaurus Lithography PWA is a process window analyzer. It is a comprehensive and powerful tool for visualizing and analyzing simulation results or experimental data, for example, obtained by critical dimension (CD) metrology measurements. From input data generally obtained from a focus-exposure matrix, PWA determines key measures that characterize the performance of the lithographic process, such as process window size or exposure latitude. Multiple datasets are analyzed individually, and the overlapping (or common) process window is determined.
PWA is a stand-alone software application designed specifically towards the analysis of CD metrology measurement data. All aspects of process window analysis functionality are also available within the Base Module of Sentaurus Lithography for standard evaluations of simulation results.
- Enable fast and effective qualification of lithography process by flexible analysis of process windows and their properties
- Support conditioning of measurement data (e.g. by smoothing or flyer elimination) to improve input data quality for subsequent data fitting in order to obtain more robust models (resist model parameter, OPC models, etc.)
- Enable effective visualization of large and complex data sets
PWA is a general-purpose tool that can analyze any multidimensional matrix of
observations as a function of two parameters. These observations (input data)
are usually CDs of a series of features – measured or simulated – as a function of
exposure dose and defocus (deviation from a nominal focus position). Other typical
indicators can be sidewall angles of resist profi les or resist thickness loss
Features
1.Process Window Analysis
Perform rectangular or elliptical fit
of process windows under various
working-point conditions
Determine overlapping process
window for multiple datasets
Compute process latitude (PW graph)
2.Data Processing
Import measurement result files
from Hitachi and Applied Materials
metrology equipment
Filter noisy input data, detect outliers,
and reduce data volume
Perform statistical analysis of
measurement data
Visualize measurement data and
analysis results
3.General Features
Support link to Sentaurus Lithography
for analysis of simulation results
Enable integration and automation of
tasks through API functionality
4.Sentaurus Lithography – Modules and
Options
Base module
Optical module – Optical lithography
process simulation
MT module – Mask topography
simulation
WT module – Wafer topography
simulationEUV module – Extreme ultraviolet
lithography simulation
E-beam module – Electron-beam
lithography simulation
MP option – Parallel computation
support
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发表于 2011-3-18 10:42:41
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