Run to Run Control in Semiconductor Manufacturing

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Run to Run Control in Semiconductor Manufacturing

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Table of Contents
Introduction
James Moyne and Arnon M. Hurwitz
PART 1: FOUNDATION FOR CONTROL
Chapter 1
Process Control in the Semiconductor Industry
Taber H. Smith, Duane S. Boning, and James Moyne
Chapter 2
Process Control and Optimization Methods for Run-to-Run Application
Enrique Del Castillo and Arnon M. Hurwitz
PART 2: R2R CONTROL ALGORITHMS
Chapter 3
Basic R2R Control Algorithms
William Moyne
Chapter 4
Learning and Optimization Algorithms for an Optimizing Adaptive Quality
Controller
Enrique Del Castillo
Chapter 5
An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear
Processes
Arnon M. Hurwitz and Enrique Del Castillo
Chapter 6
A Comparative Analysis of Run-to-Run Control Algorithms in the
Semiconductor Manufacturing Industry
Zhe Ning, James Moyne, Taber Smith, Duane Boning, Enrique Del Castillo,
Jinn-Yi Yeh, and Arnon M. Hurwitz
PART 3: INTEGRATING CONTROL
Chapter 7
Existing and Envisioned Control Environment for Semiconductor
Manufacturing
James Moyne and Joe White
Chapter 8
Design Requirements for an Integrative R2R Control Solution
James Moyne
Chapter 9
The Generic Cell Controller
James Moyne
Chapter 10
Derivation of a Piggyback Run-to-Run Control Solution Design
James Moyne
Chapter 11
Integrated Run-to-Run Control Solution Examples
James Moyne
Chapter 12
Design and Optimization of an Optimizing Adaptive Quality Controller,
Generic Cell Controller Enabled Solution
Enrique Del Castillo, Jinn-Yi Yeh, James Moyne, and Victor Solakhian
PART 4: CUSTOMIZATION METHODOLOGY
Chapter 13
Case Study: Furnace Capability Improvement Using a Customized
Run-to-Run Control Solution
Arnon Hurwitz and James Moyne
Chapter 14
Process Recipe Optimization
Enrique Del Castillo
PART 5: CASE STUDIES
Chapter 15
Multizone Uniformity Control of a CMP Process Utilizing a Pre- and
Postmeasurement Strategy
James Moyne, Chadi El Chemali, Kareemullah Khan, Rock Nadeau,
Paul Smith, John Colt, Jonathan Chapple-Sokol, and Tarun Parikh
Chapter 16
Control of Photolithography Alignment
Nital S. Patel and Robert Soper
Chapter 17
Age-Based Double EWMA Controller and Its Application to a CMP
Process
Argon Chen and Ruey-Shan Guo
PART 6: ADVANCED TOPICS
Chapter 18
Advancements in Chemical Mechanical Planarization Process Automation
and Control
James Moyne
Chapter 19
An Enhanced Exponentially Weighted Moving Average Controller for
Processes Subject to Random Disturbances
Ruey-Shan Guo, Argon Chen, and Jin-Jung Chen
Chapter 20
Enabling Generic Interprocess Multistep Control: the Active Controller
Nauman Chaudhry, James Moyne, and Elke A. Rundensteiner
PART 7: SUMMARY AND CONCLUSIONS
List of Acronyms

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lcl6000

卖2信元,好象没什么意思吧???????????

lcl6000

只要有人下载,你就自动获得5大洋,知道了?

lcl6000

等你继续传呢,几个附件??

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Run to Run Control in Semiconductor Manufacturing.

haha000

Run to Run Control in Semiconductor Manufacturing.

lcl6000

谢谢了,非常不错的资料.

haha000

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