20nm工艺下后端设计的一些特点

reweme · 发表于 2012-5-11 17:24:36

还没接触过20nm的设计，学习了

nikh243t · 发表于 2012-5-11 21:53:37

It seems a huge explaination!!!

avanti · 发表于 2012-5-12 02:10:45

回复 1# 陈涛

It is a new world with several new keywords.

1. layout dependent effect
2. double pattern check
3. template pattern check
4. voltage dependent rule
and more

For sensitive analog design or matched signals, you also need color anchor.
They are expected to be assigned to the same mask.