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[原创] FinFet current mirror design needed

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发表于 2025-8-13 05:42:37 | 显示全部楼层 |阅读模式

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Guys I cant make  an accurated cascode current mirror with FinFets

What is the trick here?
With a 16nm process the maximum gate lenght is 30nm and whatever I do the mirror is really poor.


Any sugestions?
发表于 2025-8-13 08:16:48 | 显示全部楼层
cascaded the MOSFET
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发表于 2025-8-13 08:25:39 | 显示全部楼层
self-bias cascode mirror  
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 楼主| 发表于 2025-8-14 05:26:09 | 显示全部楼层
I was using 1.8V FinFet and rubbish cm but 0.8V FinFet are fine - don't know why?
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发表于 2025-8-14 06:46:53 | 显示全部楼层
1. Basic FinFET Current Mirror Topology
A basic current mirror typically consists of two matched NMOS or PMOS transistors. In FinFETs, the same concept applies, but the current is quantized by the number of fins, not by W/L.

2. FinFET Design Considerations
Unlike planar CMOS, FinFETs don’t use W/L ratios. Instead, the drive strength is controlled by the number of fins:
  • I ∝ N_fins × (L_eff)
    • NfinsN_{fins}Nfins​: Number of fins
    • LeffL_{eff}Leff​: Effective channel length (fixed for a given process)


Key Parameters:ParameterFinFET
Width (W)W=Nfins×WfinW = N_{fins} × W_{fin}W=Nfins​×Wfin​
Gate Length (L)Defined by technology (e.g., 16nm, 7nm)
Drive StrengthControlled by number of fins
MatchingImproves with layout symmetry and common centroid techniques


. SPICE Simulation Tips
If you're simulating:
  • Use FinFET PDK (e.g., from Synopsys, Cadence, or open-source like ASAP7)
  • Use models that reflect quantized fins
  • Sweep input current (I_ref) and observe I_out
  • Perform Monte Carlo analysis for mismatch effects


3. Design StepsStep 1: Choose Technology Parameters
  • Technology node: e.g., 7nm or 14nm FinFET
  • Supply voltage: e.g., 0.7V – 1.0V
  • Fin width WfinW_{fin}Wfin​: Fixed by tech (e.g., ~7 nm)
  • Fin height HfinH_{fin}Hfin​: Also fixed

Step 2: Select Number of Fins
  • Choose N_fins = 2 or more for both M1 and M2
  • Match the number of fins for good current mirroring

Step 3: Biasing Current
  • Apply reference current (I_ref) via a current source or resistor to M1
  • Ensure M1 is in saturation

Step 4: Layout Considerations
  • Use common-centroid layout
  • Match lengths of interconnects (especially gate and drain)
  • Use dummy fins at the edges to improve symmetry


✅ 4. Example (7nm FinFET)
Assume:
  • Supply voltage: 0.8V
  • Target I_ref: 10 µA
  • Device threshold voltage VthV_{th}Vth​: ~0.3V

Design Steps:
  • Use NMOS FinFETs
  • Select 2 fins per transistor (adjust based on sizing/simulation)
  • Connect gates and M1 drain together
  • Use current source or diode-connected load to generate I_ref





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发表于 2025-8-14 08:12:53 | 显示全部楼层
i think there is sth wrong with ur PDK,
the maximum L of 16nm 0.8 FET also is not 30nm only
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发表于 2025-8-14 15:48:05 | 显示全部楼层
It is recommended to use series mos to get larger effective channel length, which also be called stack or self-cascode.
Also, the channel length limitation is only active when length is small. Try to use larger number and it will be free to set length.
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 楼主| 发表于 2025-8-15 17:54:01 | 显示全部楼层
okay thanks guys the 0.8V FinFet is fine but the 1.8V standard Vt FinFet has poor current mirroring what ever I try. Maybe the 1.8V FinFet are just poor?
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发表于 2025-8-15 19:08:57 | 显示全部楼层
多串几个就好了,finfet gm比平面工艺强。
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