15nm (FreePDK15) version 1.0

edafolks · 发表于 2014-7-24 04:57:31

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本帖最后由 edafolks 于 2014-7-24 18:03 编辑

15nm (FreePDK15) version 1.0

Yesterday, the FreePDK(TM) 15nm predictive process design kit was released by NCSU, in collaboration with NanGate and Mentor Graphics Corporation. This 15nm kit is the successor to the popular 45nm kit, which is used worldwide to teach and share digital integrated circuit design technology.

The kit released today contains definitions of the basic mask-layers used for manufacturing a digital chip in a 15nm technology, along with design-rules and customizations to use them with full-custom design software from several electronic design automation (EDA) vendors, including Mentor Graphics Calibre, Cadence Virtuoso, and Synopsys PyCell. Although the rules cannot be used for manufacturing, they do illustrate many of the most difficult issues facing 15nm manufacturers, designers, and EDA developers, including fin-FETs, middle-of-the-line layers, and double-pattern lithography. The kit is also compatible with the NanGate 15nm Open Cell Library.

15nm