各位大神好,本人小白刚刚接触28nm工艺layout的设计。最近想先从反相器入手,所以就调用了SMIC 28nmPDK下的PMOS和NMOS版图,然后进行poly,metal1连线(包含打通孔),加标签。但是进行DRC时老是报两个关于poly的错误,错误的具体信息如下:Check GT_48 (((Poly NOT P2) NOT INSIDE (DG OR TG) must be rectangle or L-shape.
DRC doesn’t check FUSEMK1, NODMF, LOGO,INST and RFSRAM region.
Check GT_49 ((((Poly NOT P2) OUTSIDE (DG OR TG)) INTERACT AA)) must be rectangle.
DRC doesn’t check FUSEMK1 , INST and RFSRAM region.
查阅了SMIC给的DRC rule文件,DG和TG分别为1.8V和2.5V的IO器件。P2为Poly trim slot。